基本解釋[電子、通信與自動控制技術]偏壓濺射[計算機科學技術]偏壓濺射英漢例句雙語例句The trapped amount of helium depends on the relative helium content in sputtering gas, applied bias and substrate temperature.實驗研究了薄膜中的 氦 含量與濺射真空室氣氛中 氦的相對 含量、基底偏壓及沉積溫度間的關系。Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.采用四極質(zhì)譜儀測量了試驗參數(shù)對高壓脈沖增強射頻磁控濺射PTFE靶等離子體氣氛的影響規(guī)律。This article mainly deals with the relationship between the negative bias of the substrate and the magnetron-sputtering ion plating aluminum film on the co- pper.本文主要論述基板員偏壓與銅基體磁控濺射離子鍍鋁膜的關系。bias sputtering更多例句詞組短語短語Modified bias sputtering 調(diào)制偏壓濺射bias sputtering system 偏壓濺鍍系統(tǒng)bias sputtering equipment 偏壓濺射設備negative substrate bias sputtering 襯底負偏壓濺射dc bias -voltage sputtering 直流偏壓二極濺射bias sputtering更多詞組專業(yè)釋義電子、通信與自動控制技術偏壓濺射計算機科學技術偏壓濺射