co-deficient cemented tungsten carbide

In the present work, diamond films were deposited on Co-deficient Cemented Tungsten Carbide by microwave plasma chemical vapor deposition (MPCVD).
本文采用低Co硬質(zhì)合金作為金剛石薄膜的基體材料,用微波等離子體化學(xué)氣相沉積法(MPCVD)沉積金剛石薄膜。