常見例句Various CVD technologies for preparing low dielectric constantmaterials in ULSI circuits are summarized. 綜述了制備ULSI低介電常數(shù)材料的各種CVD技術(shù)。Fluorin doped DLC films have low dielectric constant, and furthermore they are hydrophobe and anti-corrupttion. 摻氟DLC膜在憎水性、耐蝕性、熱穩(wěn)定性和降低介電常數(shù)等方面更為優(yōu)異;Dual damascene technology of Cu / low dielectric layer is introduced in this paper, andthis technology has been used in manufacturing DRAM and logic devices. 介紹了銅/低介電常數(shù)介電層的雙嵌入式工藝,該工藝已大規(guī)模應(yīng)用于動態(tài)記憶存儲器(DRAM)和邏輯電路器件中。In order to alleviate the problems, low dielectric constant (k) materials are used to replace the conventional intermetal dielectric (IMD), SiO2. 為了改善這些問題,使用低介電常數(shù)材料作為導(dǎo)線間的介電層為必要選擇。Dual damascene technology of Cu/ low dielectric layer is introduced in this paper, andthis technology has been used in manufacturing DRAM and logic devices. 介紹了銅/介電常數(shù)介電層的雙嵌入式工藝,該工藝已大規(guī)模應(yīng)用于動態(tài)記憶存儲器(RAM)邏輯電路器件中。The product is characteristic of low dielectric Largent at high frequency and is self fluxing It's suitable to be used as elements and coils of high frequency equipment. 該產(chǎn)品具有在高頻下漆膜的介質(zhì)損耗角正切小的特性,并且有直焊性,適應(yīng)高頻電器儀表繞圈和元件。 返回 low-dielectric