基本解釋[物理學]光學光刻英漢例句雙語例句At the present time, micro optical elements with continuous relief structure are usually fabricated by the multi-mask photolithography.目前一般采用多個二元掩模多次套刻的方法來制作連續(xù)微浮雕結構，用量化的臺階去逼近理想的輪廓。It goes with the tide of miniaturizing and integrating in optical devices. It has wide prospects for application in photolithography, fiber communication and optical information processing etc.它順應了光學元件微小化和陣列化的趨勢，在光刻、光纖通信、光學信息處理等領域有著廣闊的應用前景。optical photolithography更多例句詞組短語短語photolithography in optical near field 近場光刻蝕optical photolithography更多詞組專業(yè)釋義物理學光學光刻