基本解釋拋光漿料英漢例句雙語(yǔ)例句Chemical mechanical polishing Rough surface Microscale flow Polishing slurry;化學(xué)機(jī)械拋光； 粗糙表面； 微尺度流動(dòng)； 拋光液；Laser inducement fluorescence (LIF) is used to study the effect of polishing parameters on slurry film thickness.本文采用激光誘導(dǎo)熒光技術(shù)（LIF）來(lái)研究拋光參數(shù)對(duì)化學(xué)機(jī)械拋光加工區(qū)液膜厚度的影響。Single stage re-circulation filtrations were performed to remove oversized particles from colloidal silica based Chemical-Mechanical Polishing(CMP)slurry.單步循環(huán)過(guò)濾，用來(lái)去除膠體硅基化學(xué)機(jī)械拋光（CMP）磨料中尺寸過(guò)大的微粒。polishing slurry更多例句詞組短語(yǔ)短語(yǔ)Magnetic head polishing slurry 磁頭拋光液Nanosphere polishing slurry 納米球拋光液alkaline polishing slurry 堿性拋光液acid polishing slurry 酸性拋光液nano -diamond polishing slurry 納米金剛石拋光液polishing slurry更多詞組專(zhuān)業(yè)釋義電子、通信與自動(dòng)控制技術(shù)拋光漿料