基本解釋濺射靶英漢例句雙語例句Uses: sputtering target, physical vapor deposition, high temperature alloys.濺射靶材、物理氣相沉積、高溫合金。Uses: sputtering target, physical vapor deposition, high temperature alloy for high-voltage vacuum switch contacts and precision alloy additives.用途：濺射靶材、物理氣相沉積、高溫合金、用于高壓真空開關觸頭及精密合金添加劑。The traditional upper limit of magnetic induction density B parallel to target surface in rectangular planar magnetron sputtering target has been increased by analyzing, designing and experimenting.通過理論分析、實際設計和實驗，對矩形平面磁控濺射靶表面水平磁感應強度B的傳統(tǒng)取值上限進行了拓展。dictall.comsputtering target更多例句詞組短語短語CIGS sputtering targets 銅銦鎵硒濺射靶材alloy sputtering targets 合金濺射靶Molybdenum alloy sputtering targets 鉬合金濺射靶材Omat Sputtering Targets 歐萊濺射靶材High purity molybdenum sputtering targets 高純鉬濺射靶材sputtering target更多詞組專業(yè)釋義電子、通信與自動控制技術濺射靶