基本解釋n. 毫微光刻英漢例句雙語例句The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.具有角度限制的電子束投影曝光技術(shù)有可能成爲(wèi)21世紀(jì)最有潛力的納米光刻技術(shù)之一。Nano lithography technology plays a very important role in the field of nano electronic manufacturing, while e beam lithography is one of the best ways to produce nano features.納米光刻技術(shù)在微電子制作中起著關(guān)鍵作用，而電子束光刻在納米光刻技術(shù)制作中是最好的方法之一。These techniques include molecular assembly, arrangement of nano particles, scanning force microscopy fabrication and nano lithography based on photon beam, electron beam, and ion beam.結(jié)果對(duì)基於分子組裝與納米光刻的納料制造技術(shù)給予很大的重眡。權(quán)威例句Chou can use his Nano-Imprint Lithography technique for semiconductor markets to make designs and chips.FORBES: Adviser Soapboxnanolithography更多例句詞組短語短語nano imprinted lithography 納米壓印光刻技術(shù)nano -lithography technology 納米光刻技術(shù)E -beam nano-lithography technology research 電子束納米光刻技術(shù)研究Nano -Injection Lithography 奈米噴印成像技術(shù)nanolithography更多詞組專業(yè)釋義機(jī)械工程納米級(jí)光刻電子、通信與自動(dòng)控制技術(shù)毫微光刻毉葯科學(xué)納米刻蝕計(jì)算機(jī)科學(xué)技術(shù)奈米微影技術(shù)